Metrosol Introduced The MetroSolver Software Environment For Use With The VUV-7000 Optical Metrology System
New software offers speeds the development of the models needed to analyze optical data gathered at sub-200nm wavelenths
Austin, TX - 14 July 2008
Metrosol, Inc., a developer, manufacturer and worldwide supplier of short wavelength optical metrology solutions, today introduced its new MetroSolver modeling and analysis software, which provides a unique environment in which to develop optical models of thin film stacks from raw reflective data sets. It can also be used to create film stack libraries. Metrosol's new software environment offers customers the flexibility needed to determine the optical metrology modesl best suited for their particular processes. It is optimized to seamlessly utilize optical data gathered on Metrosol's industry-leading VUV-7000 automated, in-line vacuum ultraviolet (VUV) metrology system and helps accelerate the ability to turn that data into actionable information that can be used to improve process yields.
"Optical metrology is model based. Film stack measurements, such as film thickness or composition, are produced by minimizing the difference between an optical model describing a sample film stack and raw optical data collected from a sample of interest," said Kevin Fahey, Metrosol's CEO. "There's not, however, a lot of reference materail available for optical data for the sub-200nm wavelength range in which the VUV-7000 operates. MetroSolver faciliataes the development of the optical modes our customers need to analyze the inspection data gathered from their specific processes and to more quickly integrate advanced metrology capabilities into their sub-65nm process flows."
Metrosol’s new software environment offers powerful model development capabilities. Data from multiple samples (with no software limit to the number) can be used to create dispersion models for new materials and film stacks. Constraints between film stack layers, material dispersion parameters and individual sample parameters can be defined as part of the model development process. In addition, existing material models can be combined to create film stack models that can be used to simulated output data, which can, in turn, be used to predict measurement performance and explore applications limits with respect to sensitivity, layer thicknesses or parameter coupling. Multiple algorithms are available to maximize the optimization and may be used independently or in serial combination to optimize model robustness and speed of development.
The MetroSolver environment has a GUI look and feel for ease of use and provides both graphical and numerical methods of information visualization for most modeling aspects. Film stacks and material models can be defined, stored in libraries and later retrieved for use in modeling applications. Tauc-Lorentz, Lorentz-Lorenz, tabulated n & k and various effective medium approximation (EMA) mixing dispersion models are all supported by the MetroSolver software. Other dispersion models can be implemented based on feature demand.
The tabulated output of single or batch data sets can be generated and exported by the software environment. Range limits may be applied to fit parameters and output data is flagged if any parameter limits are reached. Visual output of any free parameter fit results can be created as three-dimensional, contour or two-dimensional color plots. Complete control over any parameter is provided and visualization templates may be created and stored for later application.
Metrosol’s patented Tru-VUV™ reflectrometry represents the leading-edge in the industry’s ultrathin film optical measurement technology, allowing precise collection of reflected light from an enhanced spectral range (800 nm all the way down to 120 nm) on a production-worthy platform. Operating at these shorter VUV wavelengths provides critical data unavailable to the development or fab engineer using other types of reflectometers or ellipsometers. Gauge capable for films below 10 Ǻ, Metrosol’s Tru-VUV© technology can decouple film thickness and composition; is sensitive to N content; as well as other low Z elements; and can measure optical properties at and below 193 nm. The VUV-7000 can provide simultaneous composition and thickness information for the new generation Hafnia-based film stacks.
For more information, please contact:
Press Contact
Christopher Castillo
Castle Communications
Phone: +1.408.244.0657
Sales Contact
Sean Jameson
VP of Sales
Metrosol
Phone: +1.512.833.8750
