PRODUCTS


VUV-7000 Series
Vacuum Ultra-Violet Wavelength Optical Metrology System
(800nm all the way down to 120 nm)

Available in both automated in-line and manual configurations.



VUV-7000 In-line Process & VUV Manual/Laboratory System

APPLICATION EXAMPLES

SEMICONDUCTOR

• Metal-Insulator-Metal (MIM) Capacitors
  • TiN / Zr Al Oxide / TiN, ZAZ, AHA, etc.
• Metal Gate
  • Dielectric Cap / High-k / IL, etc.
• Other Applications Include:
  • SiON
  • HfO & Other High-k
  • Multilayer Dielectrics (SONOS, ONO, High-k Capacitor)
  • ARC
  • CMP Polish Rates & Tool Quals
  • STI Stacks
  • Damascene Stack
  • BARC Layer Thickness, n & k & Lithographic Wavelength
  • Photoresist Track Quals
  • Etch to Clear
  • Etch Rate and Tool Quals

DATA STORAGE

Media Metrology

• DLC Measurement
  • Simultaneous measurement of thickness and composition
• Patterned Media Application
  • Under layer thickness
  • Residual layer thickness
  • Imprinted layer composition
  • Patterned layer thickness

Slider

• DLC Measurement
  • Simultaneous measurement of thickness and composition

THF Wafer

• Simultaneous DLC film thickness and composition sensitivity
• Si(O) layer and C-based layer thickness variation measurement